In-line PECVD

  Features  

·Quick RF ignition with least reflect power for uniform and stable film deposition;

·Matured and stable multi-feed in RF technology compatible for even large process chamber;

·Continuous adjustable gas between diffuser and substrate providing flexible process possibilities;

·High throughput with relative low cost, with capability of customized product design;

·Modularized design for easy installation and maintenance, together with highest safety protocol from design to fabrication.